Zhenhua Zhang
Deep etching of 4H-SiC high-aspect-ratio structures for MEMS applications.
Development and optimization of the etching process for SiC high aspect ratio structures such as through SiC vias.
MSc thesis: Inductively coupled plasma reactive ion etching of high aspect ratio structures on 4H-SiC for MEMS applications
Advisor(s): GuoQi Zhang, Sten Vollebregt, Jiarui Mo, Karen Dowling
Program: MSc Microelectronics
