Zhenhua Zhang

Deep etching of 4H-SiC high-aspect-ratio structures for MEMS applications.

Development and optimization of the etching process for SiC high aspect ratio structures such as through SiC vias.


Advisor(s): GuoQi Zhang, Sten Vollebregt, Jiarui Mo, Karen Dowling

Program: MSc Microelectronics

Zhenhua Zhang